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A joint research study has revealed unique properties of photoresist materials based on zeolitic imidazolate frameworks, showing different patterning responses depending on the radiation source used.
Chinese researchers have unveiled a technical study proposing the use of a platinum-tungsten (Pt-W) alloy as an alternative material for mask absorbers in high-numerical aperture (High-NA) extreme ultraviolet (EUV) lithography, which could contribute to improving manufacturing precision.
A compilation of results from 80 semiconductor companies showed that AI-related demand growth extended from data center processors to memory, advanced packaging, testing and manufacturing equipment. Eleven companies recorded growth exceeding 100%, while results for phones and consumer electronics were more mixed.